Publication | Closed Access

Realization of preferential (100) oriented AlN thin films on Mo coated Si substrate using reactive RF magnetron sputtering

Materials EngineeringMaterials ScienceElectrical EngineeringSi SubstrateEngineeringAluminium NitrideOxide ElectronicsSurface ScienceApplied PhysicsReactive Rf MagnetronThin FilmsMicroelectronicsChemical Vapor DepositionAln Thin FilmsThin Film Processing