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Cold CMOS as a Power-Performance-Reliability Booster for Advanced FinFETs

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2020

Year

Abstract

We present advanced FinFET characterization and circuit analysis at reduced temperatures down to 77 K. Steepened subthreshold slope enables threshold voltage (VTH) and supply voltage (VDD) scaling for ∼0.27× power reduction without sacrificing logic switching speed. With simultaneous VTH scaling, SRAM can operate at the same low VDD of 0.4V. Improved gate dielectric reliability raises maximum VDD for >70% speed boost when single thread performance is needed. Taking advantage of lower Cu wire resistance at 77 K, the repeaters for global signal propagation can be redesigned for 80% energy reduction. Increased thermal conductivity of silicon at low temperature reduces self-heating and further improves power efficiency. When refrigeration power is included, net power reduction can be achieved when cooling efficiency exceeds ∼ 50% of Carnot limit. We present effective VTH reduction methods for both nFET and pFET, critical for attaining high performance for cold CMOS.