Publication | Closed Access
Effects of Annealing on the Behavior of Sn in GeSn Alloy and GeSn-Based Photodetectors
35
Citations
27
References
2020
Year
EngineeringThin Film Process TechnologyChemical DepositionGesn FilmsIi-vi SemiconductorSn NanoparticlesNanoelectronicsAnnealing TemperatureMolecular Beam EpitaxyCompound SemiconductorThin Film ProcessingGesn AlloyMaterials ScienceMaterials EngineeringElectrical EngineeringPhysicsSemiconductor MaterialMicrostructureGesn-based PhotodetectorsMaterial AnalysisHigh Temperature MaterialsSurface ScienceApplied PhysicsMaterials CharacterizationThin FilmsOptoelectronics
Ge <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1-x</sub> Snx alloy films with Sn contents of 3% and 10% were grown on Si wafers by low-temperature nonequilibrium molecular beam epitaxy. The thermostabilities of the GeSn films and photodetectors containing them were studied. No Sn segregation was observed in Ge <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.97</sub> Sn <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.03</sub> films annealed below 750 °C. Conversely, Sn segregation occurred and Sn nanoparticles formed within the Ge <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.90</sub> Sn <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.10</sub> films annealed above 400 °C. Upon increasing the annealing temperature to 750 °C, Sn particles were thermally driven and segregated on the surface of both Ge <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.97</sub> Sn <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.03</sub> and Ge <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.90</sub> Sn <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.10</sub> films. Photodetectors were fabricated based on the as-grown and annealed Ge <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.90</sub> Sn <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.10</sub> films. Because of the decreased defect content of the Ge <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.90</sub> Sn <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.10</sub> film after annealing, the dark current of the GeSn photodetectors decreased obviously and the responsivity of the devices increased. These results are fundamentally important for the applications of high-performance photodetectors and lasers based on GeSn alloys.
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