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Multiferroic LuFeO3 on GaN by molecular-beam epitaxy
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Citations
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References
2020
Year
Materials ScienceSpintronicsElectrical EngineeringSemiconductorsOxide HeterostructuresEngineeringNanoelectronicsApplied PhysicsMultiferroic Lufeo3Aluminum Gallium NitrideGan Power DeviceGallium OxideGan Crystal StructureMultilayer HeterostructuresHexagonal Lufeo3Piezoelectric PolarizationOptoelectronicsCategoryiii-v Semiconductor
Hexagonal LuFeO3 exhibiting ferroelectricity and weak ferromagnetism is grown on metal-polar GaN by molecular-beam epitaxy. The oxide films exhibit smooth surface morphologies and are found to be single crystalline with an epitaxial relationship related by a 30° in-plane rotation relative to the GaN crystal structure. The LuFeO3 layers grown on GaN exhibit room-temperature ferroelectricity and low-temperature magnetic ordering. This epitaxial integration creates a heterostructure platform to explore and exploit the coupling of the ferroelectricity and magnetism of oxides with the strong spontaneous and piezoelectric polarization and the unique electronic and photonic properties of nitride semiconductors.
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