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The Effects of Post Annealing Process on the Electrical Performance and Stability of Al-Zn-O Thin-Film Transistors
24
Citations
17
References
2020
Year
Aluminium NitrideEngineeringElectrical PerformanceThin Film Process TechnologySemiconductor DeviceSemiconductorsNanoelectronicsPost Annealing ProcessThin Film ProcessingMaterials ScienceElectrical EngineeringCrystalline DefectsOxide ElectronicsSemiconductor MaterialMicroelectronicsSaturation MobilityAl-zn-o Thin-film TransistorsApplied PhysicsThin FilmsPositive BiasPositive Bias Stability
In this work, we studied the effects of post annealing process on the electrical performance and positive bias stability (PBS) of aluminum-zinc-oxide (AZO) thin film transistors (TFTs). Among all the devices, the TFT annealed in vacuum atmosphere exhibits excellent I-V characteristics, such as a saturation mobility (μ <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">sat</sub> ) of 45.90 cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> /V·s, a steep subthreshold swing of 263 mV/decade, a high I <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">ON</sub> /I <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">OFF</sub> ratio of 7.56 × 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">8</sup> because of its excellent film quality. In addition, the positive bias stability of TFTs annealed in different atmosphere under positive bias (+5V, 2000s) were also conveyed. The threshold voltage shift (ΔV <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">th</sub> ) was 0.3V (mixed gas, Ar:O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> = 3 : 3), 0.9V (vacuum), 1.0V (O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> ). These results can be explained by the O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">II</sub> /O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">total</sub> of the AZO films. The AZO film annealed in mixed gas (Ar:O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> = 3 : 3) has the least oxygen vacancy density that leads to the least ΔV <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">th</sub> under positive bias.
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