Method for single-shot fabrication of chiral woodpile photonic structures using phase-controlled interference lithography

Abstract

In this report, we propose a large-area, scalable and reconfigurable single-shot optical fabrication method using phase-controlled interference lithography (PCIL) to realize submicrometer chiral woodpile photonic structures. This proposed technique involves a 3 + 3 double-cone geometry with beams originated from a computed phase mask displayed on a single spatial light modulator. Simulation studies show the filtering response of such structures for linearly polarized plane wave illumination, with structural features tunable through a single parameter of interference angle. Further, these single chiral woodpile structures show dual chirality on illumination with both right circularly and left circularly polarized light through simulation. Experimentally fabricated patterns on photoresist show resemblance to the desired chiral woodpile structures.