A dry etching method for 4H-SiC via using photoresist mask - Concepedia

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A dry etching method for 4H-SiC via using photoresist mask

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2019

Year

Rui Liu, Hao Wu, Hongdan Zhang, Chen Li, Liang Tian, Ling Li, Jialin Li, Junmin Wu, Yan Pan

Journal of Crystal Growth

EngineeringApplied PhysicsDry Etching MethodSemiconductor Device FabricationMicroelectronicsPlasma EtchingOptoelectronicsCarbide

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