Publication | Closed Access
Influence of intrinsic or extrinsic doping on lattice locations of carbon in semi-insulating GaN
13
Citations
29
References
2019
Year
Wide-bandgap SemiconductorSemiconductor TechnologyElectrical EngineeringEngineeringPhysicsExtrinsic DopingNanoelectronicsSemi-insulating GanLattice LocationsApplied PhysicsCondensed Matter PhysicsAluminum Gallium NitrideGan Power DeviceDifferent Lattice LocationsCategoryiii-v SemiconductorC Atoms
We demonstrate that different doping approaches can significantly influence the lattice locations of carbon (C) in GaN grown by MOCVD. For intrinsically doped GaN with TMGa as the C source, an annealing induced switching process of C atoms from Ga sites to N sites is observed, revealing the existence of substitutional C atoms on both Ga and N sites. While for extrinsically doped GaN with propane as the C precursor, C atoms incorporate almost on N sites. From the viewpoint of growth dynamics, we propose a mechanism for C incorporation into different lattice locations.
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