Physical properties of the ferroelectric capacitors based on Al-doped HfO2 grown via Atomic Layer Deposition on Si

Silviu Vulpe, Florin Năstase, Mircea Dragoman, Adrian Dinescu, Cosmin Romanițan, Sorina Iftimie, A. Moldovan, Nicoleta G. Apostol

Applied Surface Science · 2019 · 21 citations · 32 references

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