Concepedia

Publication | Closed Access

Effects of post deposition annealing atmosphere on interfacial and electrical properties of HfO2/Ge3N4 gate stacks

DOI

14

Citations

32

References

2019

Year

Kumar Mallem, S. V. Jagadeesh Chandra, Minkyu Ju, Subhajit Dutta, Swagata Phanchanan, Simpy Sanyal, Duy Phong Pham, Shahzada Qamar Hussain, Youngkuk Kim, Jinjoo Park,
Thin Solid Films

References

YearCitations

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