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Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma

Materials ScienceChemical EngineeringEngineeringNanotechnologyOxide ElectronicsSurface ScienceApplied PhysicsNio FilmsChemical DepositionO2 PlasmaChemical Vapor DepositionAtomic Layer DepositionThin Film Processing