Controlled chemical etching leads to efficient silicon–bismuth interface for photoelectrochemical CO2 reduction to formate

Pan Ding, Yiqi Hu, Jun Deng, J. Chen, Chenyang Zha, Hui Yang, N. Han, Qiufang Gong, L. Li, T. Wang,

Materials Today Chemistry · 2018 · 40 citations · 25 references

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