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N- and P- type Doping in Al-rich AlGaN and AlN
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2018
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Aluminium NitrideWide-bandgap SemiconductorHigh ConductivityGa-rich Algan FilmsEngineeringChemistryAl-rich AlganPoint Defect ControlNanoelectronicsQuantum MaterialsMaterials ScienceMaterials EngineeringElectrical EngineeringAluminum Gallium NitrideMicroelectronicsCategoryiii-v SemiconductorCondensed Matter PhysicsApplied PhysicsGan Power Device
Attaining a high conductivity in both p-type and n-type Al-rich AlGaN epitaxial films is necessary for highly efficient deep-UV emitters. While reliable n-type conductivity has been demonstrated in AlxGa1-xN up to x < 0.8, achieving a reasonable p-type conductivity is a challenge even in Ga-rich AlGaN films. As one increases the x in AlxGa1-xN, several point defects and charge compensators appear in the epitaxial film. This report reviews recent observations on doping, conductivity, point defect control of Al-rich AlGaN films. Discussions on activation energy, state-of-the-art epitaxial material quality, contact formation and surface treatments are also presented.