EUV photofragmentation and oxidation of a polyarylene – Sulfonium resist: XPS and NEXAFS study - Concepedia

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EUV photofragmentation and oxidation of a polyarylene – Sulfonium resist: XPS and NEXAFS study

24

Citations

52

References

2018

Year

Guilherme Kretzmann Belmonte, Cleverson Alves da Silva Moura, Pulikanti Guruprasad Reddy, Kenneth E. Gonsalves, Daniel E. Weibel

Journal of Photochemistry and Photobiology A Chemistry

Materials ScienceEngineeringPhotochemistryEuv PhotofragmentationOptoelectronic MaterialsNexafs StudyChemistryPhotodegradationPhotoelectrochemistry

References

	Year	Citations

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