Molecular Glass Photoresists with High Resolution, Low LER, and High Sensitivity for EUV Lithography

Abstract

Abstract Novel molecular glasses (MGs) containing bisphenol A backbone (BPA‐6 and BPA‐10) are synthesized and characterized. BPA‐6 and BAP‐10 are excellent amorphous materials for extreme ultraviolet (EUV) patterning applications with good thermal stability ( T d more than 160 °C). The MGs can be used as positive‐tone photoresists combined with triphenylsulfonium perfluoro‐1‐butanesulfonate and trioctylamine dissolved in propylene glycol monomethyl ether acetate. High‐resolution feature sizes as small as 23.1 nm with extremely low line edge roughness (less than 2 nm), high sensitivity (less than 20 mJ cm −2 ), and good high aspect ratio patterns are obtained by using EUV lithography.