Publication | Closed Access
Tuning SERS properties of pattern-based MWNTs-AuNPs substrates by adjustment of the pattern spacings
19
Citations
28
References
2018
Year
Materials ScienceWafer Scale ProcessingEngineeringBeam LithographySers PropertiesNanotechnologyOptical PropertiesApplied PhysicsPattern TransferPattern-based Mwnts-aunps SubstratesPattern SpacingsOptoelectronicsNanolithography Method
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