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Highly stable field emission from ZnO nanowire field emitters controlled by an amorphous indium–gallium–zinc-oxide thin film transistor
15
Citations
24
References
2018
Year
EngineeringZinc OxideSemiconductor DeviceSemiconductor NanostructuresElectronic DevicesNanoelectronicsElectronic EngineeringNanowire Field EmittersCompound SemiconductorMaterials ScienceSemiconductor TechnologyElectrical EngineeringNanotechnologyOxide ElectronicsGallium OxideField Emitter ArraysElectronic MaterialsApplied PhysicsThin Films
Lowering the driving voltage and improving the stability of nanowire field emitters are essential for them to be applied in devices. In this study the characteristics of zinc oxide (ZnO) nanowire field emitter arrays (FEAs) controlled by an amorphous indium–gallium–zinc-oxide thin film transistor (a-IGZO TFT) were studied. A low driving voltage along with stabilization of the field emission current were achieved. Modulation of field emission currents up to three orders of magnitude was achieved at a gate voltage of 0–32 V for a constant anode voltage. Additionally, a-IGZO TFT control can dramatically reduce the emission current fluctuation (i.e., from 46.11 to 1.79% at an emission current of ∼3.7 µA). Both the a-IGZO TFT and ZnO nanowire FEAs were prepared on glass substrates in our research, demonstrating the feasibility of realizing large area a-IGZO TFT-controlled ZnO nanowire FEAs.
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