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30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered TiN-SiOx thin film

Materials ScienceEngineeringSurface ScienceApplied PhysicsX-ray DiffractionDefect FormationThin Film Process TechnologyThin FilmsStructural Defect GradientsTin-siox Thin FilmCrystallographyDepth-graded Multilayer CoatingMicrostructureThin Film Processing