Publication | Open Access
Intense NIR emission in YVO<sub>4</sub>:Yb<sup>3+</sup> thin films by atomic layer deposition
18
Citations
28
References
2017
Year
Materials ScienceIntense Nir EmissionEngineeringThin-film FabricationOptoelectronic MaterialsApplied PhysicsCondensed Matter PhysicsThin Film Process TechnologyThin FilmsPulsed Laser DepositionChemical Vapor DepositionAtomic Layer DepositionThin Film ProcessingSolar Cell Materials
Thin films of YVO<sub>4</sub>:Yb<sup>3+</sup> exhibiting intense NIR emission have been deposited by atomic layer deposition. The NIR emission is attributed to a quantum splitting process that could be used to enhance the efficiency of solar cells.
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