Multiparametric Kelvin Probe Force Microscopy for the Simultaneous Mapping of Surface Potential and Nanomechanical Properties

Abstract

We report high-resolution multiparametric kelvin probe force microscopy (MP-KPFM) measurements for the simultaneous quantitative mapping of the contact potential difference (CPD) and nanomechanical properties of the sample in single-pass mode. This method combines functionalities of the force-distance-based atomic force microscopy and amplitude-modulation (AM) KPFM to perform measurements in single-pass mode. During the tip-sample approach-and-retract cycle, nanomechanical measurements are performed for the retract part of nanoindentation, and the CPD is measured by the lifted probe with a constant tip-sample distance. We compare the performance of the proposed method with the conventional KPFMs by mapping the CPD of multilayer graphene deposited on n-doped silicon, and the results demonstrate that MP-KPFM has comparable performance to AM-KPFM. In addition, the experimental results of a custom-fabricated polymer grating with heterogeneous surfaces validate the multiparametric imaging capability of the MP-KPFM. This method can have potential applications in finding the inherent link between nanomechanical properties and the surface potential of the materials, such as the quantification of the electromechanical response of the deformed piezoelectric materials.