Room-temperature pulsed CVD-grown SiO<sub>2</sub> protective layer on TiO<sub>2</sub> particles for photocatalytic activity suppression - Concepedia

Concepedia

Abstract

Influence of initial surface states of TiO<sub>2</sub> on the morphology of SiO<sub>2</sub> films grown by CVD using SiCl<sub>4</sub> and air at room temperature.

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