Publication | Closed Access
Quantum spin Hall phase in stanene-derived overlayers on passivated SiC substrates
24
Citations
33
References
2016
Year
EngineeringTopological MaterialsPassivated Sic SubstratesSpintronic MaterialSemiconductorsStaneneNanoelectronicsTopological InvariantsQuantum MaterialsMagnetic Topological InsulatorEpitaxial GrowthMaterials ScienceQuantum SciencePhysicsTopological MaterialQuantum Spin HallSpintronicsTopological InsulatorCondensed Matter PhysicsApplied PhysicsStanene-derived OverlayersMultilayer HeterostructuresTopological Heterostructures
We present atomic and electronic structure studies using first-principles calculations of two-dimensional topological insulators, stanene and fluorostanene, deposited on $4H$-SiC(0001) substrates. We demonstrate the stability of H- or F-passivated honeycomb crystals due to a van der Waals interaction between the adsorbate and substrate. Despite destroyed inversion symmetry and biaxial strain the calculations of the band structures and ${Z}_{2}$ topological invariants predict that the quantum spin Hall (QSH) phase of stanene on H-passivated SiC as well as fluorostanene on H- and F-passivated SiC survives the interaction with the substrate. Our findings should serve as guidance for the epitaxial growth of tin-based QSH systems on wide-band-gap semiconductors.
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