Polishing-pad-free electrochemical mechanical polishing of single-crystalline SiC surfaces using polyurethane–CeO2 core–shell particles

Metal-assisted chemical etching of silicon and nanotechnology applications

Hee Han, Zhipeng Huang, Woo Lee · Nano Today · 2014 · 447 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Electro-chemical mechanical polishing of single-crystal SiC using CeO2 slurry

Hui Deng, Kenji Hosoya, Yusuke Imanishi et al. · Electrochemistry Communications · 2015 · 156 citations

Engineering, Materials Engineering, Materials Science +16

Electro-chemical mechanical polishing of silicon carbide

Canhua Li, Ishwara B. Bhat, Rongjun Wang et al. · Journal of Electronic Materials · 2004 · 107 citations

Engineering, Materials Engineering, Materials Science +11

Characterization of colloidal silica abrasives with different sizes and their chemical–mechanical polishing performance on 4H-SiC (0001)

Xiao‐Lei Shi, Guoshun Pan, Yan Zhou et al. · Applied Surface Science · 2014 · 105 citations

Natural Sciences, Materials Engineering, Materials Science +15

Surface characterization of 6H-SiC (0001) substrates in indentation and abrasive machining

Ling Yin, E. Vancoille, Ramesh Kuppuswamy et al. · International Journal of Machine Tools and Manufacture · 2004 · 103 citations

Natural Sciences, Materials Engineering, Materials Science +14