Band structure of the EuO/Si interface: justification for silicon spintronics

L. L. Lev, Dmitry V. Averyanov, Andrey M. Tokmachev, F. Bisti, V. A. Rogalev, Vladimir N. Strocov, Vyacheslav G. Storchak

Journal of Materials Chemistry C · 2016 · 41 citations · 62 references

Concepts

Abstract

The band offset of 1.0 eV at the EuO/Si interface attests the technological potential of the system for silicon spintronics.

References

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