Low temperature atomic layer deposition of SiO2 thin films using di-isopropylaminosilane and ozone - Concepedia

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Low temperature atomic layer deposition of SiO2 thin films using di-isopropylaminosilane and ozone

63

Citations

21

References

2016

Year

Young-Soo Lee, Dongwon Choi, Bonggeun Shong, Saeroonter Oh, Jin‐Seong Park

Ceramics International

Materials ScienceEngineeringSilicon On InsulatorSurface ScienceApplied PhysicsThin FilmsChemical DepositionChemical Vapor DepositionThin Film ProcessingSio2 Thin Films

References

	Year	Citations

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