SiGe bipolar technology for mixed digital and analogue RF applications

J. Bbck, T.F. Meister, H. Knapp, D. Zöschg, H. Schäfer, Klaus Aufinger, M. Wurzer, S. Boguth, M. Franosch, R. Stengl,

2002 · 30 citations · 8 references

Concepts

Abstract

A SiGe bipolar technology with a low-resistivity base integrated into a double-polysilicon self-aligned transistor has been developed. A transit frequency of 85 GHz, a maximum oscillation frequency of 128 GHz, 6.8 ps gate delay, and a minimum noise figure of 1.2 dB at 10 GHz demonstrate balanced transistor performance. With an 88 GHz dynamic frequency divider and a 12 GHz low noise amplifier with 1.9 dB noise figure, state-of-the-art results for digital as well as analogue applications are achieved.

References

8