Publication | Closed Access
Improvement of performances HfO 2 -based RRAM from elementary cell to 16 kb demonstrator by introduction of thin layer of Al 2 O 3
23
Citations
15
References
2016
Year
Materials EngineeringMaterials ScienceElectrical EngineeringEngineeringO 3NanoelectronicsApplied PhysicsPerformances Hfo 2Memory DeviceSemiconductor MemoryMicroelectronicsAl 2Phase Change Memory
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