Infinitely high etch selectivity during CH4/H2/Ar inductively coupled plasma (ICP) etching of indium tin oxide (ITO) with photoresist mask - Concepedia

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Infinitely high etch selectivity during CH4/H2/Ar inductively coupled plasma (ICP) etching of indium tin oxide (ITO) with photoresist mask

18

Citations

20

References

2007

Year

D.Y. Kim, J.H. Ko, Minkyung Park, Nae‐Eung Lee

Thin Solid Films

Chemical EngineeringEngineeringOptical PropertiesSurface ScienceApplied PhysicsOptoelectronic DevicesIndium Tin OxidePhotoresist MaskPlasma EtchingHigh Etch SelectivityPlasma Processing

References

	Year	Citations

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