A high-activity nitrogen plasma flow source for deposition of silicon nitride films - Concepedia

Concepedia

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A high-activity nitrogen plasma flow source for deposition of silicon nitride films

10

Citations

38

References

2016

Year

D.Q. Shi, Wei Xu, Chao Miao, Chunyu Ma, Chunsheng Ren, Wenqi Lu, Qingyu Zhang

Surface and Coatings Technology

EngineeringPhysicsSurface ScienceApplied PhysicsGas Discharge PlasmaChemical Vapor DepositionPlasma EtchingPlasma Processing

References

	Year	Citations

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