Publication | Closed Access
Structural and electronic properties of<i>h</i>-BN
603
Citations
52
References
2003
Year
Materials ScienceBoron NitrideEngineeringPhysicsDirect Band GapNatural SciencesHexagonal Boron NitrideApplied PhysicsQuantum MaterialsCondensed Matter PhysicsElectronic PropertiesQuantum ChemistryElectronic StructureTopological HeterostructuresBand Gap
Effects of stacking behavior of hexagonal basal layers to the structural stability and electronic properties of h-BN were investigated thoroughly using first-principles calculations based on the density-functional theory local-density approximation. Three of five possible h-BN structures with ``good'' stacking were found to be stable or substable. Considering that intrinsic stacking fault exist in real h-BN crystals which results in mixed stacking behavior, the experimentally observed large interlayer spacing of structures with stacking disorder such as PBN and t-BN can be understood. A substable structure with a direct band gap of about 3.395 eV was predicted. The existence of this substable structure and related intrinsic stacking fault in real h-BN explains the discrepancy in the nature of the band gap and the large variation in the observed band-gap values of h-BN.
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