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Influence of Plasma Excitation Frequency on Deposition Rate and on Film Properties for Hydrogenated Amorphous Silicon

Electrical EngineeringEngineeringPlasma Excitation FrequencyFilm PropertiesSurface ScienceApplied PhysicsSemiconductor Device FabricationDeposition RateThin FilmsSilicon On InsulatorAmorphous SolidPlasma ProcessingThin Film Processing