2RW dual-port SRAM design challenges in advanced technology nodes

Abstract

We examine appropriate bitcell layouts for two read/write (2RW) 8T dual-port (DP) SRAM in advanced planar/FinFET technologies. 256-kbit 2RW DP SRAM macros with highly symmetrical 8T DP bitcell were designed and fabricated using 16 nm FinFET technology. The read/write assist with wordline overdrive reduces Vmln by 120 mV, achieving successful operation at below 0.5 V.