Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application - Concepedia

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Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application

108

Citations

15

References

2016

Year

Gwenn Ulliac, Venancio Calero, Abdoulaye Ndao, F.I. Baida, M.-P. Bernal

Optical Materials

Electrical EngineeringEngineeringPlasma ProcessingApplied PhysicsMicroelectronicsPlasma EtchingOptoelectronicsArgon PlasmaPlasma ApplicationPlasma Reactive Ion

References

	Year	Citations

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