IEEE Electron Device Letters · 2015 · 227 citations · 14 references
EngineeringElectrical EngineeringMicroelectronicsSemiconductor DevicesSemiconductor MaterialsFerroelectric MaterialsIntegrated Circuit DesignMetal-oxide-semiconductor Field-effect TransistorsSemiconductor PhysicsShort-channel EffectsBismuth FerriteCapacitanceFerroelectric CapacitorsFerroelectric Field-effect TransistorsFin Field-effect TransistorsNegative Capacitance Field-effect TransistorsSubthreshold Swing
We report subthreshold swings as low as 8.5 mV/decade over as high as eight orders of magnitude of drain current in short-channel negative capacitance FinFETs (NC-FinFETs) with gate length <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$L_{g}=100$ </tex-math></inline-formula> nm. NC-FinFETs are constructed by connecting a high-quality epitaxial bismuth ferrite (BiFeO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> ) ferroelectric capacitor to the gate terminal of both n-type and p-type FinFETs. We show that a self-consistent simulation scheme based on Berkeley SPICE Insulated-Gate-FET Model:Common Multi Gate model and Landau–Devonshire formalism could quantitatively match the experimental NC-FinFET transfer characteristics. This also allows a general procedure to extract the effective <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$S$ </tex-math></inline-formula> -shaped ferroelectric charge–voltage characteristics that provides important insights into the device operation.
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Negative capacitance in a ferroelectric capacitor
Asif Islam Khan, Korok Chatterjee, Brian Wang et al. · Nature Materials · 2014 · 780 citations