Negative Capacitance in Short-Channel FinFETs Externally Connected to an Epitaxial Ferroelectric Capacitor

Asif Islam Khan, Korok Chatterjee, Juan Pablo Duarte, Zhong‐Yuan Lu, Angada B. Sachid, Sourabh Khandelwal, R. Ramesh, Chenming Hu, Sayeef Salahuddin

IEEE Electron Device Letters · 2015 · 227 citations · 14 references

Concepts

Abstract

We report subthreshold swings as low as 8.5 mV/decade over as high as eight orders of magnitude of drain current in short-channel negative capacitance FinFETs (NC-FinFETs) with gate length <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$L_{g}=100$ </tex-math></inline-formula> nm. NC-FinFETs are constructed by connecting a high-quality epitaxial bismuth ferrite (BiFeO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> ) ferroelectric capacitor to the gate terminal of both n-type and p-type FinFETs. We show that a self-consistent simulation scheme based on Berkeley SPICE Insulated-Gate-FET Model:Common Multi Gate model and Landau–Devonshire formalism could quantitatively match the experimental NC-FinFET transfer characteristics. This also allows a general procedure to extract the effective <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$S$ </tex-math></inline-formula> -shaped ferroelectric charge–voltage characteristics that provides important insights into the device operation.

References

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