SURFACE STRUCTURE AND PROPERTIES OF MULTICOMPONENT MICROPATTERNED ORGANOSILANE MONOLAYERS PREPARED BY STEPWISE PHOTODECOMPOSITION AND CHEMISORPTION PROCESS

Abstract

Multicomponent micropatterned organosilane monolayers were successfully fabricated on Si substrate by stepwise vacuum ultraviolet-ray (VUV) photodecomposition and chemisorption process. The area-specific introduction of different organosilane molecules was confirmed by X-ray photoelectron spectroscopy (XPS). Atomic force microscopic (AFM) observation and lateral force microscopic (LFM) measurement revealed that the line-widths of the micropatterned surface corresponded to those of photomask. Micropatterning of the functional groups influenced the magnitudes of the surface free energy. The patterned surface was also applied for the site-specific polymerization and site-specific adsorption of microparticles.