Preparation of ZrO[sub 2] Nano-Films by an Alternate Reaction Using ZrCl[sub 4] and O[sub 2] under Atmospheric Pressure

Abstract

Preparation of films with nanometer thickness has been examined using an atomic layer deposition technique under atmospheric pressure utilizing the alternate reaction of and The films obtained at 773 K were polycrystalline with tetragonal phase, suggesting that the grain size of crystallites is very small. The growth mechanism is governed by the self-limiting adsorption reaction of onto a glass substrate with a reasonably smooth surface. © 2002 The Electrochemical Society. All rights reserved.