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Comparative investigation of the nucleation and growth of fcc-metal particles (Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au) on amorphous carbon and SiO2 substrates during vapor deposition at elevated temperatures

Materials ScienceEngineeringFcc-metal ParticlesNanomaterialsSurface ScienceApplied PhysicsSio2 SubstratesNucleationVapor DepositionAmorphous SolidChemical DepositionChemical Vapor DepositionThin Film Processing