The Possibility of Carbonyl Fluoride as a New CVD Chamber Cleaning Gas

Abstract

Carbonyl fluoride has been investigated as an alternative gas for plasma-enhanced chemical vapor deposition (PECVD) chamber cleaning in order to reduce greenhouse gases emitted from the cleaning process in semiconductor manufacturing. The cleaning performance of and the environmental impact of its exhaust gases were evaluated using an experimental plasma tool. The results indicated that the cleaning performance of was equivalent to that of conventional Furthermore, it was confirmed that the use of would enable the reduction of global warming emissions by over 95% relative to the use of and thus is considered to be a promising alternative cleaning gas. © 2004 The Electrochemical Society. All rights reserved.