Effect of Mask Discretization on Performance of Silicon Arrayed Waveguide Gratings

Abstract

We studied the impact of the lithography mask discretization on silicon arrayed waveguide grating (AWG) performance. When we decreased the mask grid from 5 to 1 nm, we observed an experimental improvement in crosstalk of 2.7-6 dB and cumulative crosstalk improvement of 1.2-5 dB, depending on the wavelength channel spacing and the number of output channels. We demonstrate the effect for the AWGs with 200- and 400-GHz channel spacing, with 4, 8, and 16 output wavelength channels. With 1-nm mask grid, the average crosstalk is -26 and -23 dB for 400- and 200-GHz devices, respectively. This is the lowest crosstalk for silicon AWGs reported to the best of our knowledge. A simulation study is performed by looking specifically at phase errors due to mask grid snapping (ignoring other phase error sources), which shows an expected improvement in crosstalk of 12 dB.