Growth and properties of W–Si–N diffusion barriers deposited by chemical vapor deposition - Concepedia

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Growth and properties of W–Si–N diffusion barriers deposited by chemical vapor deposition

27

Citations

9

References

1998

Year

J. G. Fleming, E. Roherty‐Osmun, Paul Martin Smith, Jonathan S. Custer, Y.-D Kim, T. Kacsich, M.−A. Nicolet, C. Galewski

Thin Solid Films

Materials ScienceEngineeringSurface ScienceApplied PhysicsW–si–n Diffusion BarriersSemiconductor MaterialThin FilmsChemical Vapor Deposition

References

	Year	Citations

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