Journal of Physics D Applied Physics · 2013 · 65 citations · 41 references
Natural SciencesMaterials EngineeringMaterials ScienceChemical KineticsSurface ScienceThin FilmsEpitaxial GrowthNucleationSurface DiffusionSurface KineticsSurface PhysicsThin Film NucleationAdatom DiffusionDiffusivityPlume DiagnosticsPulsed Laser DepositionReflection High-energy Electron DiffractionStep-flow GrowthStoichiometric EffectsThin-film Growth Kinetics
We studied the pulsed laser deposition of homoepitaxial SrTiO3 thin films in different deposition regimes in order to elucidate the possibility to promote two-dimensional growth by increasing the kinetic energy of the oncoming particles. The kinetic energy of the oncoming species is determined by exploiting plume diagnostics techniques and the resulting nucleation and growth processes are analysed by reflection high-energy electron diffraction and atomic force microscopy. We could show that although the kinetic energy of the oncoming species varies to a great extent, the diffusion process is mostly influenced by the stoichiometry. Under stoichiometric conditions, obtained only in a limited window of process parameters, the adatoms on the surface have the highest diffusivity, thus promoting a step-flow growth mode. Under nonstoichiometric conditions, both Sr- and Ti-rich, the diffusivity is strongly reduced. This results in a transition from a two-dimensional to a three-dimensional growth under Sr-rich conditions. Conversely, in the Ti-rich case, obtained at high laser fluence, the two-dimensional growth sustains until the end of the growth process. We attribute this to the high island density available at high laser fluence which facilitates the diffusion of adatoms to step edges despite of their reduced diffusion length.
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