A novel 3D process for single-crystal silicon micro-probe structures

Abstract

A new fabrication method for a three-dimensional (3D), single-crystal silicon micro-probe structure is developed. A probe card structure requires tips that are at least 50 μm tall on cantilevers thick enough to withstand a few mN of force as well as 50 μm of tip bending. The cantilever structure also must be able to move at least 50 μm of vertical motion, requiring a large sacrificial gap. The developed 3D fabrication method is based on the surface/bulk micromachining technology, which can fabricate released, high aspect ratio, single-crystal silicon microstructures with high yield using (111) silicon.