Publication | Closed Access
Highly Robust Transparent and Conductive Gas Diffusion Barriers Based on Tin Oxide
98
Citations
33
References
2015
Year
Materials ScienceTin OxideDamp Heat ConditionsEngineeringDiffusion ResistanceRobust TransparentOxide ElectronicsSurface ScienceApplied PhysicsTransport PhenomenaIto LayersThin Film Process TechnologyThin FilmsChemical Vapor DepositionAtomic Layer DepositionThin Film Processing
Transparent and electrically conductive gas diffusion barriers are reported. Tin oxide (SnOx ) thin films grown by atomic layer deposition afford extremely low water vapor transmission rates (WVTR) on the order of 10(-6) g (m(2) day)(-1) , six orders of magnitude better than that established with ITO layers. The electrical conductivity of SnOx remains high under damp heat conditions (85 °C/85% relative humidity (RH)), while that of ZnO quickly degrades by more than five orders of magnitude.
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