Publication | Closed Access
An engineering model for short-channel MOS devices
160
Citations
8
References
1988
Year
Device ModelingElectrical EngineeringEngineeringCircuit SystemNanoelectronicsElectronic EngineeringSaturation RegionBias Temperature InstabilityShort-channel Mos DevicesMicroelectronicsBeyond CmosSemiconductor DeviceEngineering Model
An engineering model for short-channel MOS devices which includes the effect of carrier drift velocity saturation is described. Based on a piecewise carrier drift velocity model, simplified expressions for the DC drain current I/sub D/, the small signal transconductance g/sub m/ and the output conductance g/sub ds/ in the saturation region are derived. For a given gate voltage, the expressions depend only on the threshold voltage V/sub T/ and the dimensions of the device, whose desired values are normally known.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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