Near‐Field Lithography by Two‐Photon Induced Photocleavage of Organic Monolayers

Abstract

Abstract We prove that the enhanced electromagnetic near‐field around metallic nanostructures can be used for localized two‐photon induced activation of surfaces, obtaining a defined chemical pattern with nanometric resolution. Gold nanoparticles (Au‐NP) are deposited on glass slides that were modified with a polysiloxane layer containing a nitroveratrylcarbonyl (NVoc) photoremovable group. Upon illumination with a femtosecond laser, the NVoc entity is removed. Due to the electromagnetic field enhancement of the nanoparticles, the threshold of this process is lowered in the nm‐scale vicinity of the metal structures. Upon cleavage, an amine functional group is released, which can be used to site‐selectively bind species with complementary chemical functionality on the surface. This method can be utilized for sub‐wavelength chemical structuring.