Publication | Open Access
Radio-Frequency Magnetron Sputtering Power Effect on the Ionic Conductivities of Lipon Films
89
Citations
20
References
2002
Year
EngineeringElectrode-electrolyte InterfaceLipon FilmsLithium Phosphorous OxynitrideChemistryCharge TransportChemical EngineeringNanoelectronicsMaterials ScienceSolid-state IonicPhysicsOxide ElectronicsElectrical InsulationElectrochemical ProcessElectrical PropertyElectrochemistryNatural SciencesSurface ScienceApplied PhysicsIonic ConductorIonic ConductivitiesThin FilmsGlass Structure
Lithium phosphorous oxynitride (Lipon) films were deposited in gas atmosphere with different radio-frequency magnetron sputtering power from 80 to 160 W with 20 W step increase. Lipon films deposited at lower sputtering power showed higher ionic conductivities than the films deposited at higher sputtering power. The results of impedance measurements showed that nitrogen incorporation into the glass structure increased the ionic conductivity and this nitrogen content in the Lipon films increased as the sputtering power decreased. In addition, the Auger electron spectroscopy depth profile showed that the increased nitrogen content in the Lipon films was not the result of the target surface poisoning effect but the result of reactive incorporation of nitrogen. © 2001 The Electrochemical Society. All rights reserved.
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