Publication | Closed Access
Interfacial mechanical testing of atomic layer deposited TiO<sub>2</sub> and Al<sub>2</sub>O<sub>3</sub> on a silicon substrate by the use of embedded SiO<sub>2</sub> microspheres
10
Citations
13
References
2014
Year
Materials ScienceMaterials EngineeringEngineeringInterfacial Mechanical EvaluationMechanical EngineeringApplied PhysicsSurface ScienceInterfacial Mechanical TestingThin FilmsSilicon SubstrateChemical DepositionAtomic LayerChemical Vapor DepositionDepth-graded Multilayer CoatingMicrostructureThin Film Processing
A novel measurement technique is presented for interfacial mechanical evaluation of especially atomic layer deposited (ALD) thin films.
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