Highly Stable and Imperceptible Electronics Utilizing Photoactivated Heterogeneous Sol‐Gel Metal–Oxide Dielectrics and Semiconductors

Abstract

Incorporation of Zr into an AlOx matrix generates an intrinsically activated ZAO surface enabling the formation of a stable semiconducting IGZO film and good interfacial properties. Photochemically annealed metal-oxide devices and circuits with the optimized sol-gel ZAO dielectric and IGZO semiconductor layers demonstrate the high performance and electrically/mechanically stable operation of flexible electronics fabricated via a low-temperature solution process.