Publication | Closed Access
Investigation of the oxygen-vacancy (A-center) defect complex profile in neutron irradiated high resistivity silicon junction particle detectors
62
Citations
17
References
1992
Year
Oxygen VacancyElectrical EngineeringSilicon Wafer DepthEngineeringNuclear PhysicsRadiation DetectionPhysicsCrystalline DefectsNatural SciencesApplied PhysicsNeutron SourceSingle Event EffectsSilicon DetectorsDetector PhysicNuclear MaterialsDefect FormationDefect Complex ProfileNeutron Scattering
The distribution of the A-center (oxygen vacancy) in neutron-damaged silicon detectors was studied using deep level transient spectroscopy. A-centers were found to be nearly uniformly distributed in the silicon wafer depth for medium-resistivity (0.1-0.2-k Omega -cm) silicon detectors and high-resistivity (>4-k Omega -cm) high-temperature (1200 degrees C) oxidized detectors. A positive filling pulse was needed to detect the A-centers in high-resistivity silicon detectors, and this effect was found to be dependent on the oxidation temperature. The A-center was not observed in a sample from a high-temperature oxidation with TCA having a very high carbon content.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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