Principles and characteristics of a new generation plasma immersion ion implanter

TLDR

A new generation multipurpose plasma immersion ion implanter (PIII) was custom designed, constructed, and installed at the City University of Hong Kong, offering critical capabilities for studying surface properties and corrosion resistance. The article outlines the design objectives, novel features, and characteristics of the PIII, which is intended for general R&D in metallurgy, tribology, surface modification, and novel material fabrication. The PIII employs an rf ion source with an internal antenna to achieve uniform plasma density, and incorporates multiple metal sources—including four arc sources and a sputtering electrode—to enable successive deposition and implantation steps without air exposure.

Abstract

A new generation multipurpose plasma immersion ion implanter (PIII) was custom designed, constructed, and installed in the City University of Hong Kong. The system is designed for general R&D applications in metallurgy, tribology, surface modification, and fabrication of novel materials. Using the new rf ion source in conjunction with the internal antenna system, the plasma density achieves excellent uniformity both laterally and axially. The system also incorporates two metal sources, including four metal arc sources and a sputtering electrode, so that multiple metal deposition and implantation steps can be performed in succession in the same equipment without exposing the samples to air. This capability can be critical to the study of surface properties and corrosion resistance. This article describes the design objectives, the novel features, and the characteristics of this new generation PIII equipment.